EUV Lithography Market
EUV Lithography Market Size, Share & Industry Analysis, By Light Source (Laser-Produced Plasma, Discharge-Produced Plasma, Others), By Application (Memory, Logic, Others), By End-use Industry (Foundry, Integrated Device Manufacturer, Others), By Region (North America, Europe, Asia-Pacific, Latin America, Middle East & Africa) -- Industry Trends, Size, Share, Growth and Forecast 2024-2031.
Market Overview:
The global EUV Lithography Market is projected to grow at a CAGR of 12.5% during the forecast period from 2024 to 2031. The market size is expected to reach XX in 2024 and YY by 2031. Asia-Pacific dominates the market, accounting for approximately 60% of the global market share. Key metrics include the increasing adoption of EUV lithography in semiconductor manufacturing, rising demand for high-performance and energy-efficient electronic devices, and advancements in EUV technology.
The EUV lithography industry is expanding rapidly, driven by the ongoing miniaturisation of semiconductor devices, the increasing complexity of chip designs, and the growing need for sophisticated lithography solutions. The move from traditional deep ultraviolet (DUV) lithography to EUV lithography allows for the fabrication of smaller and more powerful devices, which is driving the semiconductor industry's growth.
Market Dynamics:
Growing adoption of EUV lithography in high-volume manufacturing
The EUV lithography market is undergoing a substantial shift towards high-volume manufacturing (HVM), as semiconductor makers increasingly use EUV technology to produce sophisticated devices. EUV lithography's better resolution and patterning capabilities allow for the manufacture of smaller and more sophisticated chip designs, which are critical in the development of next-generation electronic devices.
The number of EUV lithography equipment installed for HVM has increased by 50% in the last two years. Industry analysts project that by 2030, EUV lithography would account for more than 70% of the global lithography market for advanced nodes (7nm and lower), driven by rising demand for high-performance computing, artificial intelligence, and 5G technologies.
Advancements in EUV light source technology
The EUV lithography market benefits from ongoing advances in EUV light source technology, which is important to the performance and productivity of EUV lithography equipment. The development of high-power and reliable EUV light sources is critical for allowing high-volume chip fabrication with EUV lithography.
According to a recent survey of EUV lithography equipment suppliers, the average power of EUV light sources has risen by 30% in the last three years, reaching 250 watts or more. The emergence of sophisticated light source technologies, such as laser-produced plasma (LPP) and discharge-produced plasma (DPP), has considerably increased the stability and efficiency of EUV light sources, hence facilitating industrial deployment of EUV lithography.
High cost of EUV lithography systems and infrastructure
Despite the increasing acceptance of EUV lithography, the high cost of EUV lithography systems and accompanying infrastructure continues to be a key commercial challenge. EUV lithography systems are extremely sophisticated and expensive, with a single system costing more than $100 million. Smaller semiconductor manufacturers and foundries may find it difficult to use EUV lithography due to the significant capital commitment required.
A recent examination of the EUV lithography cost structure shows that the EUV light source and mask account for a sizable amount of the total system cost. The creation of cost-effective EUV components, as well as the optimisation of the EUV lithography process, are critical for lowering overall ownership costs and enabling further adoption of EUV technology in the semiconductor industry.
Segment Overview:
The logic chips segment dominates the EUV lithography market, accounting for over 60% of the market share.
The EUV lithography market is primarily driven by logic chips such as microprocessors, application processors, and field-programmable gate arrays (FPGAs). The growing need for high-performance computers, mobile devices, and data centre infrastructure is driving the use of EUV lithography in the manufacturing of sophisticated logic chips.
According to market data, revenue from EUV lithography systems used for logic chip production has increased by 40% over the last three years, exceeding growth in the memory industry. The continual scaling of logic circuits to smaller nodes (7nm, 5nm, and beyond) and the rising complexity of chip designs are the primary drivers of demand for EUV lithography in the logic segment.
The memory segment has the second-largest market share, owing to the rising use of EUV lithography in the manufacture of DRAM and NAND flash memory. According to industry reports, the number of EUV layers employed in memory chip production has doubled over the last two years, with leading memory makers moving to EUV lithography for important layers to increase chip performance and cost-effectiveness..
Regional Outlook:
Asia-Pacific leads the global EUV Lithography market, with a market share of approximately 60%.
Asia-Pacific's dominance in the EUV lithography market is due to the presence of key semiconductor manufacturers, foundries, and equipment providers in the area. Countries like Taiwan, South Korea, and China are leading the way in EUV lithography adoption, thanks to their strong semiconductor manufacturing capabilities and rising demand for innovative electronic gadgets.
According to Semiconductor Equipment and Materials International (SEMI), Asia-Pacific accounts for more than 80% of all EUV lithography systems installed worldwide, with Taiwan and South Korea leading the way. The region's significant concentration of semiconductor production facilities, together with leading chipmakers' strong investment in EUV technology, are key drivers of market growth.
North America and Europe are also key markets for EUV lithography, accounting for around 20% and 15% of the market, respectively. The presence of major semiconductor businesses such as Intel Corporation and ASML Holding N.V., as well as increased investment in EUV lithography research and development, are driving market expansion in these regions.
The EUV lithography market in North America is primarily driven by the growing use of EUV technology by leading integrated device makers (IDMs) for improved logic and memory chips. The European market is distinguished by the presence of a robust ecosystem of EUV lithography equipment suppliers and research organisations focused on the advancement of next-generation EUV technology.
Competitive Intelligence:
The EUV lithography business is dominated by a few important players, namely ASML Holding N.V., which has a near monopoly on EUV lithography equipment. The high technological barriers and large capital commitment necessary for EUV lithography development have reduced the number of market participants.
ASML Holding N.V., a Dutch semiconductor equipment manufacturer, is the world's top supplier of EUV lithography systems. Major semiconductor manufacturers include Taiwan Semiconductor Manufacturing Company (TSMC), Samsung Electronics, and Intel Corporation, who use the company's EUV lithography technologies. ASML announced 45% year-over-year growth in EUV lithography sales in 2023, owing to strong demand from customers upgrading to advanced nodes.
Canon Inc. and Nikon Corporation are also important players in the EUV lithography business, with a focus on developing next-generation EUV lithography technology. These firms are investing in R&D to enhance the performance, productivity, and cost-effectiveness of EUV lithography systems.
The EUV lithography business is also distinguished by strategic alliances and partnerships among equipment vendors, semiconductor makers, and research organisations. ASML, for example, has long-term supply agreements with key chipmakers to ensure that EUV lithography systems are delivered on schedule and to help develop future EUV technologies.
Analyst Opinion:
The EUV Lithography market is expected to grow significantly in the future years, driven by increased adoption of EUV technology in high-volume manufacturing, continuing miniaturisation of semiconductor devices, and rising demand for innovative electronic products. The market is predicted to rapidly shift from traditional DUV lithography to EUV lithography, particularly in the fabrication of sophisticated logic and memory devices.
However, the high cost of EUV lithography systems and accompanying infrastructure remains a major barrier to market expansion. To address this challenge, equipment providers, semiconductor manufacturers, and governments will need to work together to create low-cost EUV technologies and build a strong EUV lithography ecosystem.
Increased investments in EUV lithography R&D, together with rising demand for high-performance computing, artificial intelligence, and 5G technologies, are projected to fuel industry innovation. The advancement of next-generation EUV technologies, such as high-NA EUV lithography and multi-beam EUV lithography, holds enormous promise for producing even smaller and more sophisticated semiconductors.
To stay ahead of the competition and meet the changing needs of the semiconductor industry, companies must focus on expanding their EUV lithography product portfolios, strengthening their partnerships with customers and suppliers, and investing in research and development activities.
Major Players:
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ASML Holding N.V.
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Canon Inc.
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Nikon Corporation
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Carl Zeiss AG
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NTT Advanced Technology Corporation
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Toppan Photomasks, Inc.
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Applied Materials, Inc.
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KLA Corporation
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Lam Research Corporation
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Tokyo Electron Limited
Key Developments:
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In September 2024, ASML Holding N.V. unveiled a new high-NA EUV lithography machine with a numerical aperture of 0.55, allowing for the manufacture of sub-3nm semiconductors with better resolution and throughput.
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Canon Inc. revealed in June 2024 that it was developing a new EUV resist material with improved sensitivity and resolution, with the goal of producing sophisticated logic and memory devices in large volumes.
1. INTRODUCTION
1.1. Market Definitions & Study Assumptions
1.2. Market Research Scope & Segment
1.3. Research Methodology
2. EXECUTIVE SUMMARY
2.1. Market Overview & Insights
2.2. Segment Outlook
2.3. Region Outlook
3. COMPETITIVE INTELLIGENCE
3.1. Companies Financial Position
3.2. Company Benchmarking -- Key Players
3.3. Market Share Analysis -- Key Companies
3.4. Recent Companies Key Activities
3.5. Pricing Analysis
3.6. SWOT Analysis
4. COMPANY PROFILES (Key Companies list by Country) (Premium) *
5. COMPANY PROFILES
5.1. ASML Holding N.V.
5.2. Canon Inc.
5.3. Nikon Corporation
5.4. Carl Zeiss AG
5.5. NTT Advanced Technology Corporation
5.6. Toppan Photomasks, Inc.
5.7. Applied Materials, Inc.
5.8. KLA Corporation
5.9. Lam Research Corporation
5.10. Tokyo Electron Limited (*LIST NOT EXHAUSTIVE)
6. MARKET DYNAMICS
6.1. Market Trends
6.1.1. Growing adoption of EUV lithography in high-volume manufacturing
6.1.2. Increasing demand for advanced electronic devices
6.1.3. Continuous miniaturization of semiconductor devices
6.2. Market Drivers
6.2.1. Advancements in EUV light source technology
6.2.2. Growing demand for high-performance computing, AI, and 5G technologies
6.2.3. Increasing investments in EUV lithography research and development
6.3. Market Restraints
6.3.1. High cost of EUV lithography systems and infrastructure
6.3.2. Limited availability of EUV lithography equipment and components
6.4. Market Opportunities
6.5. Porter's Five Forces Analysis
6.5.1. Threat of New Entrants
6.5.2. Bargaining Power of Buyers/Consumers
6.5.3. Bargaining Power of Suppliers
6.5.4. Threat of Substitute Products
6.5.5. Intensity of Competitive Rivalry
6.6. Supply Chain Analysis
6.7. Value Chain Analysis
6.8. Trade Analysis
6.9. Pricing Analysis
6.10. Regulatory Analysis
6.11. Patent Analysis
6.12. SWOT Analysis
6.13. PESTLE Analysis
7. BY LIGHT SOURCE (MARKET SIZE/VALUE (US$ Mn), SHARE (%), MARKET FORECAST (%), YOY GROWTH (%)-- 2020-2031)
7.1. Laser-Produced Plasma
7.2. Discharge-Produced Plasma
7.3. Others
8. BY APPLICATION (MARKET SIZE/VALUE (US$ Mn), SHARE (%), MARKET FORECAST (%), YOY GROWTH (%)-- 2020-2031)
8.1. Memory
8.2. Logic
8.3. Others
9. BY END-USE INDUSTRY (MARKET SIZE/VALUE (US$ Mn), SHARE (%), MARKET FORECAST (%), YOY GROWTH (%)-- 2020-2031)
9.1. Foundry
9.2. Integrated Device Manufacturer
9.3. Others
10. REGION (MARKET SIZE/VALUE (US$ Mn), SHARE (%), MARKET FORECAST (%), YOY GROWTH (%)-- 2020-2031)
10.1. North America
10.1.1. US
10.1.2. Canada
10.2. Europe
10.2.1. Germany
10.2.2. UK
10.2.3. France
10.2.4. Italy
10.2.5. Spain
10.2.6. Rest of Europe
10.3. Asia-Pacific
10.3.1. China
10.3.2. India
10.3.3. Japan
10.3.4. Australia
10.3.5. South Korea
10.3.6. Rest of APAC
10.4. Latin America
10.4.1. Brazil
10.4.2. Mexico
10.4.3. Rest of Latin America
10.5. Middle East & Africa
10.5.1. South Africa
10.5.2. GCC Countries
10.5.3. Rest of EMEA
*NOTE: All the segments mentioned in the scope will be provided with (MARKET SIZE/VALUE (US$ Mn), SHARE (%), MARKET FORECAST (%), YOY GROWTH (%)-- 2020-2031)
EUV Lithography Market Segmentation:
By Light Source:
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Laser-Produced Plasma
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Discharge-Produced Plasma
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Others
By Application:
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Memory
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Logic
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Others
By End-use Industry:
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Foundry
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Integrated Device Manufacturer
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Others
By Region:
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North America
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Europe
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Asia-Pacific
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Latin America
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Middle East & Africa
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